/ 半導體材料 / IC製程用化學品與特殊氣體

IC製程用化學品與特殊氣體


Wafer/IC/LCD Process Chemical(晶圓/半導體/液晶 製程用化學品)
(H2SO4,H2O2, IPA, NH4OH…)

CVD Precursor(化學氣相沉積材料)
TDMAT/TiCl4/TMA/TEASAT/InI/InF3/InCl3/High-K/Low-K Material
TEOS,TMB,TEB,TMPO,TEPO,TDMAT,TiCl4等

Polyimide(聚亞醯胺)
Positive Photosensitive Wafer Coating
SUMIRESIN EXCEL CRC-8300 series

Specialty Gases(特殊氣體)
NH3, N2O, NO, CO, B2H6, SiH4, SiH2Cl2, SiHCL3,Si2H6, NF3, WF6等